1200C Vacuum crucible annealing furnace for semiconductor wafer

1200C Vacuum crucible annealing furnace for semiconductor wafer

1200C Vacuum crucible annealing furnace is composed by quartz crucible or alumina crucible and stainless steel flange.It is mainly used for sintering of high pure compound under vacuum or inert atmosphere, annnealing or spreading of semiconfuctor wafer and roasting or sintering of ceramic material.It have below outstanding features:

1:Max Vacuum can upto -0.1Mpa.

2: Good leak tightness.

3:Perfect heating preservation.  

4:Better Temperature uniformity.

5: Precise temperature control.

6:Excellent thermal Insulation .

Standard package included with the furnace

Package: Plastic paper inside, Polyfoam filled, Wooden box outside.

Payment: L/C T/T, West union,etc.

Shipping and Delivery: by air , in 15 days after receiving the payment