ETD-900C Sputtering Carbon Analyzer

ETD-900C Sputtering Carbon Analyzer

ETD-900C Sputter evaporator is designed on the principle of Diode (DC) DC sputtering. Diode (DC) DC sputtering is one of the most simple, reliable, economic coating system, which is also used by many manufacturers of sputtering instrument or heat evaporating &coating instrument. It includes: An immersion bell installed in the top of control box (ie Vacuum chamber), with Cathode target and stage; a control box, which consists of Vacuum gauge, high voltage power supply, air-release valve, timer and related logic circuit; mechanical pump. As for Cressington108 Sputter Coater, it matched with sample sputtering vacuum display table, Sputtering current indicator, Adjust controller, Mini vacuum valve, and timer. Working with internal automatic control circuit, that is easy to control the vacuum chamber pressure, current and selected ionization of ionized gas, and then find the best opportunity to coat. Special design of the immersion bell’s edge rubber sealing ring, can use for long time, instead of appearing "side damage" phenomenon, which influenced the vacuum degree of sample sputtering chamber. In addition, ceramic sealing high pressure head is more durable than the usual rubber. According to the characteristics of gas ionization, it could make the sputtering film cleaner and better-distributed, by using a larger capacity vacuum chamber and sputtering target area, which is greatly suitable for SEM specimen preparation in SEM DEMO and electrode production for new material research. 

Specification:

A. Target (Upper electrode):

Material: gold, φ50mm, 0.12mm thick

B. Vacuum Specimen Chamber: φ160mm, 120mm H

C. Deposition Rate: 0-20nm/min

D. Vacuum Display Table: Maximum Range ≤ 3X10-2  mbar

E. Ion ammeter: Maximum Range 50mA

F. Timer: not more than 360S

G. Mini vacuum valve: suitable for connectingφ3mm pipe with any gas

H. Maximum Voltage   -1600 DCV

I. Mechanical Pump: LEYBOLD D8C

J. Dimension: L 300mm  W 360mm  H 400mm

LIst 

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